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Deposition Kinetics of Thin Silica-Like Coatings in a Large Plasma Reactor
An industrial size plasma reactor of 5 m(3) volume was used to study the deposition of silica-like coatings by the plasma-enhanced chemical vapor deposition (PECVD) method. The plasma was sustained by an asymmetrical capacitively coupled radio-frequency discharge at a frequency of 40 kHz and power u...
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| Vydáno v: | Materials (Basel) |
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| Hlavní autoři: | , , , , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
MDPI
2019
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6803826/ https://ncbi.nlm.nih.gov/pubmed/31623307 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma12193238 |
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