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Fabrication and characterization of Si(1−)(x)Ge(x) nanocrystals in as-grown and annealed structures: a comparative study
Multilayer structures comprising of SiO(2)/SiGe/SiO(2) and containing SiGe nanoparticles were obtained by depositing SiO(2) layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse magnetron sputtering (HiPIMS). The as-g...
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| Vydáno v: | Beilstein J Nanotechnol |
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| Hlavní autoři: | , , , , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Beilstein-Institut
2019
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6774067/ https://ncbi.nlm.nih.gov/pubmed/31598453 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.10.182 |
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