Fabrication and characterization of Si(1−)(x)Ge(x) nanocrystals in as-grown and annealed structures: a comparative study

Multilayer structures comprising of SiO(2)/SiGe/SiO(2) and containing SiGe nanoparticles were obtained by depositing SiO(2) layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse magnetron sputtering (HiPIMS). The as-g...

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Detalhes bibliográficos
Publicado no:Beilstein J Nanotechnol
Main Authors: Sultan, Muhammad Taha, Maraloiu, Adrian Valentin, Stavarache, Ionel, Gudmundsson, Jón Tómas, Manolescu, Andrei, Teodorescu, Valentin Serban, Ciurea, Magdalena Lidia, Svavarsson, Halldór Gudfinnur
Formato: Artigo
Idioma:Inglês
Publicado em: Beilstein-Institut 2019
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Full Research Paper
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6774067/
https://ncbi.nlm.nih.gov/pubmed/31598453
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.10.182
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