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Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask
This paper proposes a method for improving the patterning resolution of conventional contact photolithography from the micrometer, down to the sub-micrometer scale. The key element is a soft polydimethylsiloxane (PDMS) photomask, which is first replicated from a silicon mold and then patterned with...
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| Publicado no: | Micromachines (Basel) |
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| Main Authors: | , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2019
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6723422/ https://ncbi.nlm.nih.gov/pubmed/31426559 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi10080547 |
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