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Fast Semiconductor–Metal Bidirectional Transition by Flame Chemical Vapor Deposition
[Image: see text] A simple yet powerful flame chemical vapor deposition technique is proposed that allows free control of the surface morphology, microstructure, and composition of existing materials with regard to various functionalities within a short process time (in seconds) at room temperature...
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| Publicado no: | ACS Omega |
|---|---|
| Main Authors: | , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American Chemical Society
2019
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| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6682083/ https://ncbi.nlm.nih.gov/pubmed/31460291 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.9b01112 |
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