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Inverse Moth Eye Nanostructures with Enhanced Antireflection and Contamination Resistance
[Image: see text] Moth-eye-inspired nanostructures are highly useful for antireflection applications. However, block copolymer micelle lithography, an effective method to prepare moth eye nanopillars, can only be used on a limited choice of substrates. Another drawback of nanopillar substrates is th...
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| Publicado en: | ACS Omega |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
American Chemical Society
2017
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| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6641947/ https://ncbi.nlm.nih.gov/pubmed/31457778 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.7b01001 |
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