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Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
Complex surface nanostructures were observed in germanium and silicon samples exposed to low energy (24 or 36 eV ion kinetic energy) helium plasma. Pyramidal growth is observed in germanium across the temperature range studied (185 °C to 336 °C), while significant modification in silicon was only ob...
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| Veröffentlicht in: | Sci Rep |
|---|---|
| Hauptverfasser: | , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Nature Publishing Group UK
2019
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6626129/ https://ncbi.nlm.nih.gov/pubmed/31300694 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-019-46541-w |
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