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Atomic-scale diffusion rates during growth of thin metal films on weakly-interacting substrates
We use a combined experimental and theoretical approach to study the rates of surface diffusion processes that govern early stages of thin Ag and Cu film morphological evolution on weakly-interacting amorphous carbon substrates. Films are deposited by magnetron sputtering, at temperatures T(S) betwe...
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| Veröffentlicht in: | Sci Rep |
|---|---|
| Hauptverfasser: | , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Nature Publishing Group UK
2019
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6488595/ https://ncbi.nlm.nih.gov/pubmed/31036908 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-019-43107-8 |
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