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Microstructure and Oxidation Behavior of Metal V Films Deposited by Magnetron Sputtering
Direct-current magnetron sputtering (DCMS) was applied to prepare vanadium (V) films on Si substrate. The influence of substrate temperature (T(s)) and target–substrate distance (D(t–s)) on phase structure and surface morphology of V films were investigated by X-ray diffraction (XRD), scanning elect...
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| Pubblicato in: | Materials (Basel) |
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| Autori principali: | , , , , , , , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
MDPI
2019
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6384545/ https://ncbi.nlm.nih.gov/pubmed/30704091 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma12030425 |
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