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Determination of the vapour pressure curves and vaporization enthalpies of hafnium alkoxides using thermogravimetric analysis

In order to identify a volatile metallo-organic precursor for the deposition of hafnium oxide (HfO(2)) films for atomic layer deposition (ALD) applications, the evaporative properties of hafnium alkoxides (hafnium isopropoxide, hafnium n-propoxide and hafnium n-butoxide) were investigated using ther...

Deskribapen osoa

Gorde:
Xehetasun bibliografikoak
Argitaratua izan da:R Soc Open Sci
Egile Nagusiak: Wang, Changhong, Yang, Shenghai, Chen, Yongming
Formatua: Artigo
Hizkuntza:Inglês
Argitaratua: The Royal Society 2019
Gaiak:
Sarrera elektronikoa:https://ncbi.nlm.nih.gov/pmc/articles/PMC6366183/
https://ncbi.nlm.nih.gov/pubmed/30800369
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1098/rsos.181193
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