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Structural and Optical Properties of Silicon Nanowire Arrays Fabricated by Metal Assisted Chemical Etching With Ammonium Fluoride
Here we report on the metal assisted chemical etching method of silicon nanowires (SiNWs) manufacturing, where the commonly used hydrofluoric acid (HF) has been successfully replaced with ammonium fluoride (NH(4)F). The mechanism of the etching process and the effect of the pH values of H(2)O(2): NH...
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| Pubblicato in: | Front Chem |
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| Autori principali: | , , , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Frontiers Media S.A.
2019
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6328714/ https://ncbi.nlm.nih.gov/pubmed/30662894 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3389/fchem.2018.00653 |
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