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Structural and Optical Properties of Silicon Nanowire Arrays Fabricated by Metal Assisted Chemical Etching With Ammonium Fluoride

Here we report on the metal assisted chemical etching method of silicon nanowires (SiNWs) manufacturing, where the commonly used hydrofluoric acid (HF) has been successfully replaced with ammonium fluoride (NH(4)F). The mechanism of the etching process and the effect of the pH values of H(2)O(2): NH...

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Detalhes bibliográficos
Publicado no:Front Chem
Main Authors: Gonchar, Kirill A., Kitaeva, Veronika Y., Zharik, George A., Eliseev, Andrei A., Osminkina, Liubov A.
Formato: Artigo
Idioma:Inglês
Publicado em: Frontiers Media S.A. 2019
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6328714/
https://ncbi.nlm.nih.gov/pubmed/30662894
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3389/fchem.2018.00653
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