Structural and Optical Properties of Silicon Nanowire Arrays Fabricated by Metal Assisted Chemical Etching With Ammonium Fluoride

Here we report on the metal assisted chemical etching method of silicon nanowires (SiNWs) manufacturing, where the commonly used hydrofluoric acid (HF) has been successfully replaced with ammonium fluoride (NH(4)F). The mechanism of the etching process and the effect of the pH values of H(2)O(2): NH...

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Dades bibliogràfiques
Publicat a:Front Chem
Autors principals: Gonchar, Kirill A., Kitaeva, Veronika Y., Zharik, George A., Eliseev, Andrei A., Osminkina, Liubov A.
Format: Artigo
Idioma:Inglês
Publicat: Frontiers Media S.A. 2019
Matèries:
Chemistry
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC6328714/
https://ncbi.nlm.nih.gov/pubmed/30662894
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3389/fchem.2018.00653
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