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Fabrication of Through via Holes in Ultra-Thin Fused Silica Wafers for Microwave and Millimeter-Wave Applications

Through via holes in fused silica are a key infrastructure element of microwave and millimeter-wave circuits and 3D integration. In this work, etching through via holes in ultra-thin fused silica wafers using deep reactive-ion etching (DRIE) and laser ablation was developed and analyzed. The experim...

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Detalhes bibliográficos
Publicado no:Micromachines (Basel)
Main Authors: Li, Xiao, Chan, King Yuk, Ramer, Rodica
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2018
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6187369/
https://ncbi.nlm.nih.gov/pubmed/30424072
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi9030138
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