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High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography
Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular...
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| Publicado no: | Beilstein J Nanotechnol |
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| Main Authors: | , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Beilstein-Institut
2018
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6071703/ https://ncbi.nlm.nih.gov/pubmed/30116695 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.9.194 |
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