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Investigating the Trimethylaluminium/Water ALD Process on Mesoporous Silica by In Situ Gravimetric Monitoring
A low amount of AlO(x) was successfully deposited on an unordered, mesoporous SiO(2) powder using 1–3 ALD (Atomic Layer Deposition) cycles of trimethylaluminium and water. The process was realized in a self-built ALD setup featuring a microbalanceand a fixed particle bed. The reactor temperature was...
Gorde:
| Argitaratua izan da: | Nanomaterials (Basel) |
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| Egile Nagusiak: | , , , , |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
MDPI
2018
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| Gaiak: | |
| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6027410/ https://ncbi.nlm.nih.gov/pubmed/29795021 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano8060365 |
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