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Development of Ordered, Porous (Sub-25 nm Dimensions) Surface Membrane Structures Using a Block Copolymer Approach

In an effort to develop block copolymer lithography to create high aspect vertical pore arrangements in a substrate surface we have used a microphase separated poly(ethylene oxide) -b- polystyrene (PEO-b-PS) block copolymer (BCP) thin film where (and most unusually) PS not PEO is the cylinder formin...

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Publicat a:Sci Rep
Autors principals: Ghoshal, Tandra, Holmes, Justin D., Morris, Michael A.
Format: Artigo
Idioma:Inglês
Publicat: Nature Publishing Group UK 2018
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Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC5940818/
https://ncbi.nlm.nih.gov/pubmed/29740003
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-018-25446-0
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