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Thermal nanoimprint lithography for drift correction in super-resolution fluorescence microscopy

Localization-based super-resolution microscopy enables imaging of biological structures with sub-diffraction-limited accuracy, but generally requires extended acquisition time. Consequently, stage drift often limits the spatial precision. Previously, we reported a simple method to correct for this b...

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Bibliografski detalji
Izdano u:Opt Express
Glavni autori: Youn, Yeoan, Ishitsuka, Yuji, Jin, Chaoyi, Selvin, Paul R.
Format: Artigo
Jezik:Inglês
Izdano: Optical Society of America 2018
Teme:
Online pristup:https://ncbi.nlm.nih.gov/pmc/articles/PMC5901072/
https://ncbi.nlm.nih.gov/pubmed/29402038
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1364/OE.26.001670
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