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Thermal nanoimprint lithography for drift correction in super-resolution fluorescence microscopy
Localization-based super-resolution microscopy enables imaging of biological structures with sub-diffraction-limited accuracy, but generally requires extended acquisition time. Consequently, stage drift often limits the spatial precision. Previously, we reported a simple method to correct for this b...
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| Vydáno v: | Opt Express |
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| Hlavní autoři: | , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Optical Society of America
2018
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5901072/ https://ncbi.nlm.nih.gov/pubmed/29402038 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1364/OE.26.001670 |
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