Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys

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Bibliografske podrobnosti
izdano v:Sci Rep
Main Authors: Zallo, Eugenio, Cecchi, Stefano, Boschker, Jos E., Mio, Antonio M., Arciprete, Fabrizio, Privitera, Stefania, Calarco, Raffaella
Format: Artigo
Jezik:Inglês
Izdano: Nature Publishing Group UK 2018
Teme:
Author Correction
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC5859102/
https://ncbi.nlm.nih.gov/pubmed/29556097
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-018-23156-1
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