Rapid Wafer-Scale Growth of Polycrystalline 2H-MoS(2) by Pulsed Metalorganic Chemical Vapor Deposition

High volume manufacturing of devices based on transition metal dichalcogenide (TMD) ultra-thin films will require deposition techniques that are capable of reproducible wafer-scale growth with monolayer control. To date, TMD growth efforts have largely relied upon sublimation and transport of solid...

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Vydáno v:Chem Mater
Hlavní autoři: Kalanyan, Berc, Kimes, William A., Beams, Ryan, Stranick, Stephan J., Garratt, Elias, Kalish, Irina, Davydov, Albert V., Kanjolia, Ravindra K., Maslar, James E.
Médium: Artigo
Jazyk:Inglês
Vydáno: 2017
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On-line přístup:https://ncbi.nlm.nih.gov/pmc/articles/PMC5846631/
https://ncbi.nlm.nih.gov/pubmed/29545674
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.chemmater.7b01367
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