Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

The self-assembly of a lamellar-forming polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D(3)). The number avera...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Borah, Dipu, Cummins, Cian, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Salaun, Mathieu, Zelsmann, Marc, Liontos, George, Ntetsikas, Konstantinos, Avgeropoulos, Apostolos, Morris, Michael A.
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2018
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Article
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5791119/
https://ncbi.nlm.nih.gov/pubmed/29315245
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano8010032
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