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Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
[Image: see text] Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article demonstrates an integrated approach for developing isolated sub-20 nm silicon oxide features through combined “top-down” and “bott...
Gorde:
| Argitaratua izan da: | ACS Omega |
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| Egile Nagusiak: | , , , , , , , , |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
American Chemical Society
2017
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| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6641768/ https://ncbi.nlm.nih.gov/pubmed/31457733 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.7b00781 |
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