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Low-temperature atomic layer deposition of SiO(2)/Al(2)O(3) multilayer structures constructed on self-standing films of cellulose nanofibrils
In this paper, we have optimized a low-temperature atomic layer deposition (ALD) of SiO(2) using AP-LTO® 330 and ozone (O(3)) as precursors, and demonstrated its suitability to surface-modify temperature-sensitive bio-based films of cellulose nanofibrils (CNFs). The lowest temperature for the therma...
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| Publicado no: | Philos Trans A Math Phys Eng Sci |
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| Main Authors: | , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
The Royal Society Publishing
2018
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5746552/ https://ncbi.nlm.nih.gov/pubmed/29277735 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1098/rsta.2017.0037 |
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