Low-temperature atomic layer deposition of SiO(2)/Al(2)O(3) multilayer structures constructed on self-standing films of cellulose nanofibrils

In this paper, we have optimized a low-temperature atomic layer deposition (ALD) of SiO(2) using AP-LTO® 330 and ozone (O(3)) as precursors, and demonstrated its suitability to surface-modify temperature-sensitive bio-based films of cellulose nanofibrils (CNFs). The lowest temperature for the therma...

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Bibliografiske detaljer
Udgivet i:Philos Trans A Math Phys Eng Sci
Main Authors: Putkonen, Matti, Sippola, Perttu, Svärd, Laura, Sajavaara, Timo, Vartiainen, Jari, Buchanan, Iain, Forsström, Ulla, Simell, Pekka, Tammelin, Tekla
Format: Artigo
Sprog:Inglês
Udgivet: The Royal Society Publishing 2018
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Articles
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC5746552/
https://ncbi.nlm.nih.gov/pubmed/29277735
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1098/rsta.2017.0037
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