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Broadband Dielectric Spectroscopic Characterization of Thermal Stability of Low-k Dielectric Thin Films for Micro- and Nanoelectronic Applications

In this paper, we discuss the use of broadband microwaves (MW) to characterize the thermal stability of organic and hybrid silicon-organic thin films meant for insulation applications in micro- and nanoelectronic devices. We take advantage of MW propagation characteristics to extract and examine the...

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Bibliografski detalji
Izdano u:ECS J Solid State Sci Technol
Glavni autori: Sunday, Christopher E., Montgomery, Karl R., Amoah, Papa K., Obeng, Yaw S.
Format: Artigo
Jezik:Inglês
Izdano: 2017
Teme:
Online pristup:https://ncbi.nlm.nih.gov/pmc/articles/PMC5714312/
https://ncbi.nlm.nih.gov/pubmed/29214117
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1149/2.0141709jss
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