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Morphological Evolution of Pit-Patterned Si(001) Substrates Driven by Surface-Energy Reduction
Lateral ordering of heteroepitaxial islands can be conveniently achieved by suitable pit-patterning of the substrate prior to deposition. Controlling shape, orientation, and size of the pits is not trivial as, being metastable, they can significantly evolve during deposition/annealing. In this paper...
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| Veröffentlicht in: | Nanoscale Res Lett |
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| Hauptverfasser: | , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Springer US
2017
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5622022/ https://ncbi.nlm.nih.gov/pubmed/28963645 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-2320-5 |
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