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Charge Splitting In Situ Recorder (CSIR) for Real-Time Examination of Plasma Charging Effect in FinFET BEOL Processes

A novel device for monitoring plasma-induced damage in the back-end-of-line (BEOL) process with charge splitting capability is first-time proposed and demonstrated. This novel charge splitting in situ recorder (CSIR) can independently trace the amount and polarity of plasma charging effects during t...

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Bibliografiske detaljer
Udgivet i:Nanoscale Res Lett
Main Authors: Tsai, Yi-Pei, Hsieh, Ting-Huan, Lin, Chrong Jung, King, Ya-Chin
Format: Artigo
Sprog:Inglês
Udgivet: Springer US 2017
Fag:
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC5603469/
https://ncbi.nlm.nih.gov/pubmed/28924695
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-2309-0
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