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The investigation of stress in freestanding GaN crystals grown from Si substrates by HVPE

We investigate the stress evolution of 400 µm-thick freestanding GaN crystals grown from Si substrates by hydride vapour phase epitaxy (HVPE) and the in situ removal of Si substrates. The stress generated in growing GaN can be tuned by varying the thickness of the MOCVD AlGaN/AlN buffer layers. Micr...

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Bibliografiske detaljer
Udgivet i:Sci Rep
Main Authors: Lee, Moonsang, Mikulik, Dmitry, Yang, Mino, Park, Sungsoo
Format: Artigo
Sprog:Inglês
Udgivet: Nature Publishing Group UK 2017
Fag:
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC5561118/
https://ncbi.nlm.nih.gov/pubmed/28819151
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-017-08905-y
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