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Bubble-Pen Lithography
Current lithography techniques, which employ photon, electron, or ion beams to induce chemical or physical reactions for micro/nano-fabrication, have remained challenging in patterning chemically synthesized colloidal particles, which are emerging as building blocks for functional devices. Herein, w...
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| Publicado no: | Nano Lett |
|---|---|
| Main Authors: | , , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2015
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5490994/ https://ncbi.nlm.nih.gov/pubmed/26678845 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.nanolett.5b04524 |
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