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Bubble-Pen Lithography

Current lithography techniques, which employ photon, electron, or ion beams to induce chemical or physical reactions for micro/nano-fabrication, have remained challenging in patterning chemically synthesized colloidal particles, which are emerging as building blocks for functional devices. Herein, w...

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Bibliografische gegevens
Gepubliceerd in:Nano Lett
Hoofdauteurs: Lin, Linhan, Peng, Xiaolei, Mao, Zhangming, Li, Wei, Yogeesh, Maruthi N., Rajeeva, Bharath Bangalore, Perillo, Evan P., Dunn, Andrew K, Akinwande, Deji, Zheng, Yuebing
Formaat: Artigo
Taal:Inglês
Gepubliceerd in: 2015
Onderwerpen:
Online toegang:https://ncbi.nlm.nih.gov/pmc/articles/PMC5490994/
https://ncbi.nlm.nih.gov/pubmed/26678845
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.nanolett.5b04524
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