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In-Process Atomic-Force Microscopy (AFM) Based Inspection
A new in-process atomic-force microscopy (AFM) based inspection is presented for nanolithography to compensate for any deviation such as instantaneous degradation of the lithography probe tip. Traditional method used the AFM probes for lithography work and retract to inspect the obtained feature but...
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| Pubblicato in: | Sensors (Basel) |
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| Autore principale: | |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
MDPI
2017
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5490694/ https://ncbi.nlm.nih.gov/pubmed/28561747 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s17061194 |
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