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In-Process Atomic-Force Microscopy (AFM) Based Inspection
A new in-process atomic-force microscopy (AFM) based inspection is presented for nanolithography to compensate for any deviation such as instantaneous degradation of the lithography probe tip. Traditional method used the AFM probes for lithography work and retract to inspect the obtained feature but...
Gorde:
| Argitaratua izan da: | Sensors (Basel) |
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| Egile nagusia: | |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
MDPI
2017
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| Gaiak: | |
| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5490694/ https://ncbi.nlm.nih.gov/pubmed/28561747 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s17061194 |
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