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Electrical and Photoelectrical Properties of Reduced Graphene Oxide—Porous Silicon Nanostructures

In this work, the hybrid structures were created by electrochemical etching of silicon wafer and deposition of reduced graphene oxide (RGO) on the porous silicon (PS) layer. With the help of SEM and AFM, the formation of hybrid PS–RGO structure was confirmed. By means of current–voltage characterist...

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Detalhes bibliográficos
Publicado no:Nanoscale Res Lett
Main Authors: Olenych, Igor B., Aksimentyeva, Olena I., Monastyrskii, Liubomyr S., Horbenko, Yulia Yu., Partyka, Maryan V.
Formato: Artigo
Idioma:Inglês
Publicado em: Springer US 2017
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5391343/
https://ncbi.nlm.nih.gov/pubmed/28410550
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-2043-7
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