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Self-organized growth of graphene nanomesh with increased gas sensitivity
A bottom-up chemical vapor deposition (CVD) process for the growth of graphene nanomesh films is demonstrated. The process relies on silicon nanospheres to block nucleation sites for graphene CVD on copper substrates. These spheres are formed in a self-organized way through silicon diffusion through...
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| Publicat a: | Nanoscale |
|---|---|
| Autors principals: | , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Royal Society of Chemistry
2016
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5314685/ https://ncbi.nlm.nih.gov/pubmed/27523310 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1039/c6nr03954e |
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