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Submicrometer Microelectronics Dimensional Metrology: Scanning Electron Microscopy
The increasing integration of microelectronics into the submicrometer region for VHSIC and VLSI applications necessitates the examination of these structures both for linewidth measurement and defect inspection by systems other than the optical microscope. The low beam-voltage scanning electron micr...
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| Udgivet i: | J Res Natl Bur Stand (1977) |
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| Main Authors: | , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1987
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| Fag: | |
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5286967/ https://ncbi.nlm.nih.govhttp://dx.doi.org/10.6028/jres.092.018 |
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