Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic i...

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Publicat a:Adv Sci (Weinh)
Autors principals: Jeong, Hyeon‐Ho, Mark, Andrew G., Lee, Tung‐Chun, Son, Kwanghyo, Chen, Wenwen, Alarcón‐Correa, Mariana, Kim, Insook, Schütz, Gisela, Fischer, Peer
Format: Artigo
Idioma:Inglês
Publicat: John Wiley and Sons Inc. 2015
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Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC5115437/
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/advs.201570022
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