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Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. [Image:...
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| Publicado no: | Adv Sci (Weinh) |
|---|---|
| Main Authors: | , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
John Wiley and Sons Inc.
2015
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5115431/ https://ncbi.nlm.nih.gov/pubmed/27980957 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/advs.201500016 |
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