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High-quality AlN epitaxy on nano-patterned sapphire substrates prepared by nano-imprint lithography
We report epitaxial growth of AlN films with atomically flat surface on nano-patterned sapphire substrates (NPSS) prepared by nano-imprint lithography. The crystalline quality can be greatly improved by using the optimized 1-μm-period NPSS. The X-ray diffraction ω-scan full width at half maximum val...
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| Publicado no: | Sci Rep |
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| Main Authors: | , , , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group
2016
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5095705/ https://ncbi.nlm.nih.gov/pubmed/27812006 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep35934 |
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