High speed e-beam writing for large area photonic nanostructures — a choice of parameters

Photonic nanostructures are used for many optical systems and applications. However, some high-end applications require the use of electron-beam lithography (EBL) to generate such nanostructures. An important technological bottleneck is the exposure time of the EBL systems, which can exceed 24 hours...

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Vydáno v:Sci Rep
Hlavní autoři: Li, Kezheng, Li, Juntao, Reardon, Christopher, Schuster, Christian S., Wang, Yue, Triggs, Graham J., Damnik, Niklas, Müenchenberger, Jana, Wang, Xuehua, Martins, Emiliano R., Krauss, Thomas F.
Médium: Artigo
Jazyk:Inglês
Vydáno: Nature Publishing Group 2016
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On-line přístup:https://ncbi.nlm.nih.gov/pmc/articles/PMC5025733/
https://ncbi.nlm.nih.gov/pubmed/27633902
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep32945
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