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Ordered Peierls distortion prevented at growth onset of GeTe ultra-thin films
Using reflection high-energy electron diffraction (RHEED), the growth onset of molecular beam epitaxy (MBE) deposited germanium telluride (GeTe) film on Si(111)-(√3 × √3)R30°-Sb surfaces is investigated, and a larger than expected in-plane lattice spacing is observed during the deposition of the fir...
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| Publicat a: | Sci Rep |
|---|---|
| Autors principals: | , , , , , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Nature Publishing Group
2016
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5017194/ https://ncbi.nlm.nih.gov/pubmed/27612303 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep32895 |
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