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Top-Down Nanofabrication and Characterization of 20 nm Silicon Nanowires for Biosensing Applications
A top-down nanofabrication approach is used to develop silicon nanowires from silicon-on-insulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the cruc...
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| 出版年: | PLoS One |
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| 主要な著者: | , , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Public Library of Science
2016
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4811568/ https://ncbi.nlm.nih.gov/pubmed/27022732 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1371/journal.pone.0152318 |
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