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Positive-bias gate-controlled metal–insulator transition in ultrathin VO(2) channels with TiO(2) gate dielectrics

The next generation of electronics is likely to incorporate various functional materials, including those exhibiting ferroelectricity, ferromagnetism and metal–insulator transitions. Metal–insulator transitions can be controlled by electron doping, and so incorporating such a material in transistor...

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Detalhes bibliográficos
Publicado no:Nat Commun
Main Authors: Yajima, Takeaki, Nishimura, Tomonori, Toriumi, Akira
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group 2015
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4682056/
https://ncbi.nlm.nih.gov/pubmed/26657761
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/ncomms10104
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