Yajima, T., Nishimura, T., & Toriumi, A. (2015). Positive-bias gate-controlled metal–insulator transition in ultrathin VO(2) channels with TiO(2) gate dielectrics. Nat Commun.
シカゴスタイル引用形Yajima, Takeaki, Tomonori Nishimura, , Akira Toriumi. "Positive-bias Gate-controlled Metal–insulator Transition in Ultrathin VO(2) Channels With TiO(2) Gate Dielectrics." Nat Commun 2015.
MLA引用形式Yajima, Takeaki, Tomonori Nishimura, , Akira Toriumi. "Positive-bias Gate-controlled Metal–insulator Transition in Ultrathin VO(2) Channels With TiO(2) Gate Dielectrics." Nat Commun 2015.
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