Molecular pathways for defect annihilation in directed self-assembly

Over the last few years, the directed self-assembly of block copolymers by surface patterns has transitioned from academic curiosity to viable contender for commercial fabrication of next-generation nanocircuits by lithography. Recently, it has become apparent that kinetics, and not only thermodynam...

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Dades bibliogràfiques
Publicat a:Proc Natl Acad Sci U S A
Autors principals: Hur, Su-Mi, Thapar, Vikram, Ramírez-Hernández, Abelardo, Khaira, Gurdaman, Segal-Peretz, Tamar, Rincon-Delgadillo, Paulina A., Li, Weihua, Müller, Marcus, Nealey, Paul F., de Pablo, Juan J.
Format: Artigo
Idioma:Inglês
Publicat: National Academy of Sciences 2015
Matèries:
Physical Sciences
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4655562/
https://ncbi.nlm.nih.gov/pubmed/26515095
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1073/pnas.1508225112
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