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Molecular pathways for defect annihilation in directed self-assembly
Over the last few years, the directed self-assembly of block copolymers by surface patterns has transitioned from academic curiosity to viable contender for commercial fabrication of next-generation nanocircuits by lithography. Recently, it has become apparent that kinetics, and not only thermodynam...
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| Publicado en: | Proc Natl Acad Sci U S A |
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| Autores principales: | , , , , , , , , , |
| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
National Academy of Sciences
2015
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| Materias: | |
| Acceso en línea: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4655562/ https://ncbi.nlm.nih.gov/pubmed/26515095 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1073/pnas.1508225112 |
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