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Fabrication of 3-nm-thick Si(3)N(4) membranes for solid-state nanopores using the poly-Si sacrificial layer process
To improve the spatial resolution of solid-state nanopores, thinning the membrane is a very important issue. The most commonly used membrane material for solid-state nanopores is silicon nitride (Si(3)N(4)). However, until now, stable wafer-scale fabrication of Si(3)N(4) membranes with a thickness o...
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| Udgivet i: | Sci Rep |
|---|---|
| Main Authors: | , , , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Nature Publishing Group
2015
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| Fag: | |
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4589763/ https://ncbi.nlm.nih.gov/pubmed/26424588 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep14656 |
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