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Interfacial reaction control and its mechanism of AlN epitaxial films grown on Si(111) substrates by pulsed laser deposition

High-quality AlN epitaxial films have been grown on Si substrates by pulsed laser deposition (PLD) by effective control of the interfacial reactions between AlN films and Si substrates. The surface morphology, crystalline quality and interfacial property of as-grown AlN/Si hetero-interfaces obtained...

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Detalles Bibliográficos
Publicado en:Sci Rep
Main Authors: Wang, Wenliang, Yang, Weijia, Liu, Zuolian, Wang, Haiyan, Wen, Lei, Li, Guoqiang
Formato: Artigo
Idioma:Inglês
Publicado: Nature Publishing Group 2015
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Acceso en liña:https://ncbi.nlm.nih.gov/pmc/articles/PMC4473646/
https://ncbi.nlm.nih.gov/pubmed/26089026
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep11480
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