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Interfacial reaction control and its mechanism of AlN epitaxial films grown on Si(111) substrates by pulsed laser deposition

High-quality AlN epitaxial films have been grown on Si substrates by pulsed laser deposition (PLD) by effective control of the interfacial reactions between AlN films and Si substrates. The surface morphology, crystalline quality and interfacial property of as-grown AlN/Si hetero-interfaces obtained...

पूर्ण विवरण

में बचाया:
ग्रंथसूची विवरण
में प्रकाशित:Sci Rep
मुख्य लेखकों: Wang, Wenliang, Yang, Weijia, Liu, Zuolian, Wang, Haiyan, Wen, Lei, Li, Guoqiang
स्वरूप: Artigo
भाषा:Inglês
प्रकाशित: Nature Publishing Group 2015
विषय:
ऑनलाइन पहुंच:https://ncbi.nlm.nih.gov/pmc/articles/PMC4473646/
https://ncbi.nlm.nih.gov/pubmed/26089026
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep11480
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