Development of low-fluorescence thick photoresist for high-aspect-ratio microstructure in bio-application

In this study, we propose and evaluate a novel low-auto-fluorescence photoresist (SJI photoresist) for bio-application, e.g., in gene analysis and cell assay. The spin-coated SJI photoresist has a wide thickness range of ten to several hundred micrometers, and photoresist microstructures with an asp...

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Detalhes bibliográficos
Publicado no:Biomicrofluidics
Main Authors: Tamai, H., Maruo, K., Ueno, H., Terao, K., Kotera, H., Suzuki, T.
Formato: Artigo
Idioma:Inglês
Publicado em: AIP Publishing LLC 2015
Assuntos:
SPECIAL TOPIC: SELECT PAPERS FROM THE 8th IEEE INTERNATIONAL CONFERENCE ON NANO/MOLECULAR MEDICINE AND ENGINEERING HELD IN KAOHSIUNG, TAIWAN (GUEST EDITORS DA-JENG YAO AND CHAO-MIN CHENG)
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4401797/
https://ncbi.nlm.nih.gov/pubmed/25945132
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.4917511
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