Improving the dielectric properties of an electrowetting-on-dielectric microfluidic device with a low-pressure chemical vapor deposited Si(3)N(4) dielectric layer

Dielectric breakdown is a common problem in a digital microfluidic system, which limits its application in chemical or biomedical applications. We propose a new fabrication of an electrowetting-on-dielectric (EWOD) device using Si(3)N(4) deposited by low-pressure chemical vapor deposition (LPCVD) as...

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Publicat a:Biomicrofluidics
Autors principals: Shen, Hsien-Hua, Chung, Lung-Yuan, Yao, Da-Jeng
Format: Artigo
Idioma:Inglês
Publicat: AIP Publishing LLC 2015
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SPECIAL TOPIC: SELECT PAPERS FROM THE 8th IEEE INTERNATIONAL CONFERENCE ON NANO/MOLECULAR MEDICINE AND ENGINEERING HELD IN KAOHSIUNG, TAIWAN (GUEST EDITORS DA-JENG YAO AND CHAO-MIN CHENG)
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4376753/
https://ncbi.nlm.nih.gov/pubmed/25825614
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.4915613
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