Shen, H., Chung, L., & Yao, D. (2015). Improving the dielectric properties of an electrowetting-on-dielectric microfluidic device with a low-pressure chemical vapor deposited Si(3)N(4) dielectric layer. Biomicrofluidics.
Styl ChicagoShen, Hsien-Hua, Lung-Yuan Chung, a Da-Jeng Yao. "Improving the Dielectric Properties of an Electrowetting-on-dielectric Microfluidic Device With a Low-pressure Chemical Vapor Deposited Si(3)N(4) Dielectric Layer." Biomicrofluidics 2015.
Citace podle MLAShen, Hsien-Hua, Lung-Yuan Chung, a Da-Jeng Yao. "Improving the Dielectric Properties of an Electrowetting-on-dielectric Microfluidic Device With a Low-pressure Chemical Vapor Deposited Si(3)N(4) Dielectric Layer." Biomicrofluidics 2015.
Upozornění: Tyto citace jsou generovány automaticky. Nemusí být zcela správně podle citačních pravidel..